Overview Residual Stress Summit 2005

The focus of the RS Summit 2005 is applied residual stresses technology. The central objective is to bring together residual stress users, (who have "problems" in search of "solutions") and developers (who have "solutions" in search of "problems"). Both groups of people benefit from the interchange. Over 50 users and developers attended the first RS Summit in December 2003. Based on the active participation and much positive feedback, the meeting objective was certainly achieved. Many participants also indicated their strong interest in attending a similar meeting in the future.

Summit Schedule and overview:

• Welcome reception Tuesday evening August 9 (included with registration)
• Summit Wednesday-Thursday August 10-11
• Possible post-summit meetings Friday August 12
  • Hole drilling shourt couse
• Conference dinner Wednesday evening (included with registration)

New Features:

• All new talks - no repeats.
• Expert talks expanded to "appled technology," not just measurements.
• Poster session to allow contributed work.

Retained Features from Summit 2003:

• Practical focus, all invited talks. No speciaized research talks.
• Group lunches and banquet to facilitate unstructured interactions.
• Single track rather than parallel sessions.
• Informal conference proceedings will be prepared and distributed after the Summit.

Program Outline:

• Invited Industrial Talks: What are the industrial unsolved problems? ~ 5 talks at 30 minutes each
• Invited Expert Talks: What is the state-of-the art in residual stress technology? ~ 8-10 talks at 25 minutes each
• Other talks: Round Robins, activities of outside groups (ASTM, SAE, etc) ~ 7 talks at 10 minutes each
• Poster/Demos Session: ~ 2 hours. Integrated as part of the proceedings, and does not run during breaks or concurrently with any scheduled talks, meaning that participants in this session will have the undivided attention of the full audience.
  • Tables/Demos of Measurement and Other Technology, unstructured interaction.
  • Poster Session: Contributed posters on all aspects of technology, measurement, and industrial problems.